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Use of Michelson and Fabry–Perot interferometry for independent determination of the refractive index and physical thickness of wafers

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Abstract

We present a method to independently measure the refractive index and the thickness of materials having flat and parallel sides by using a combination of Michelson and Fabry–Perot interferometry techniques. The method has been used to determine refractive-index values in the infrared with uncertainties in the third decimal place and thicknesses accurate to within ±5 μm for materials at room and cryogenic temperatures.

© 2005 Optical Society of America

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