Abstract

An interferometric optical isolator that employs a nonreciprocal phase shift was studied. The optical isolator consisted of an interferometer with distinct layer structures. A traveling light wave underwent distinct nonreciprocal phase shifts such that the optical isolator could be operated in a unidirectional magnetic field. The optical isolator, in which the waveguide had a HfO₂ cladding layer in one of the arms, was designed at a wavelength of 1.55 μm. The propagation distance of the nonreciprocal phase shifter required for the isolator’s operation was less than 1.5 mm. The device’s total length was less than 2 mm. An optical isolator with distinct layer structures was fabricated and evaluated. An isolation ratio of approximately 9.9 dB was obtained in the unidirectional magnetic field.

© 2004 Optical Society of America

Demonstration of an optical isolator with a semiconductor guiding layer that was obtained by use of a nonreciprocal phase shift

Hideki Yokoi, Tetsuya Mizumoto, Nobuhiro Shinjo, Naoki Futakuchi, and Yoshiaki Nakano
Appl. Opt. 39(33) 6158-6164 (2000)

Demonstration of an optical isolator by use of a nonreciprocal phase shift

Hideki Yokoi, Tetsuya Mizumoto, Tomoaki Takano, and Nobuhiro Shinjo
Appl. Opt. 38(36) 7409-7413 (1999)

Elimination of a back-reflected TE mode in a TM-mode optical isolator with a Mach–Zehnder interferometer

Hideki Yokoi, Tetsuya Mizumoto, Shinpei Kuroda, Takafumi Ohtsuka, and Yoshiaki Nakano
Appl. Opt. 41(33) 7045-7051 (2002)

Wideband design of nonreciprocal phase shift magneto-optical isolators using phase adjustment in Mach-Zehnder interferometers

Yuya Shoji and Tetsuya Mizumoto
Appl. Opt. 45(27) 7144-7150 (2006)

Optical nonreciprocal devices with a silicon guiding layer fabricated by wafer bonding

Hideki Yokoi, Tetsuya Mizumoto, and Yuya Shoji
Appl. Opt. 42(33) 6605-6612 (2003)