Abstract

We describe a high-temperature lithium extreme-ultraviolet (EUV) source based on a capillary discharge configuration that was developed for operating with metal vapors. The source produces narrow-band emission at 13.5 nm in the EUV spectral region, with emission intensity proportional to the lithium-vapor density. At an operating temperature of 725 °C, our measurements showed that, on axis, the source generated approximately 0.2 (mJ/2π sr)/pulse at 13.5 nm.

© 2000 Optical Society of America

Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

M. A. Klosner, H. A. Bender, W. T. Silfvast, and J. J. Rocca
Opt. Lett. 22(1) 34-36 (1997)

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

M. A. Klosner and W. T. Silfvast
Opt. Lett. 23(20) 1609-1611 (1998)

Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

Marc A. Klosner and William T. Silfvast
Appl. Opt. 40(27) 4849-4851 (2001)

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma

Klaus Bergmann, Guido Schriever, Oliver Rosier, Martin Müller, Willi Neff, and Rainer Lebert
Appl. Opt. 38(25) 5413-5417 (1999)

Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency

Klaus Bergmann, Oliver Rosier, Willi Neff, and Rainer Lebert
Appl. Opt. 39(22) 3833-3837 (2000)