Abstract

We used double electron-beam coevaporation to fabricate TiO₂–SiO₂ mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO₂ to pure TiO₂ as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO₂ content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO₂ film because of its amorphous structure.

Linear and Bruggeman's effective medium approximation models fit the experimental data better than other models.

© 1996 Optical Society of America

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