Abstract

We introduced the fast alternating sputter method and its application on deposition of TiO₂–SiO₂ mixed films. By using fast alternating sputter, the TiO₂ and SiO₂ were completely mixed in the film, and no thin-pair structure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide composition range. The optical properties of the mixed films in the visible and near infrared changed from SiO₂-dominant to TiO₂-dominant TiO₂ content in the film increased.

© 1991 Optical Society of America

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