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Ellipsometric analysis for surface roughness and texture

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Abstract

A 2-D symmetric model is incorporated into the calculation of the ellipsometric parameters Ψ and Δ for surface roughness and texture characterization based on the effective medium theory. The least-squares fits of the experimental data at a 5-μm IR wavelength for rough fused silica samples at multiple angles of incidence give the standard deviations of Ψ and Δ of about twice the instrumental errors. The effective thickness and the depolarization factor obtained by ellipsometry agree with the roughness and average height-to-halfwidth ratio of voids obtained by stylus profilometry. The surface texture can be characterized by the fit depolarization factors set. The excellent agreement between theory and experiments indicates that ellipsometry can be a promising nondestructive technique for rough-surface evaluation.

© 1988 Optical Society of America

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