Abstract

The application of thin-film Luneburg lenses to integrated optical circuits will require accurate control of their focal length to permit the necessary alignment between the various circuit elements. Of particular interest is the design of lenses for application to a silicon-based integrated optical rf spectrum analyzer. This study analyzes the sensitivity of the focal length of Luneburg lenses to thickness variation at the lens center resulting from fabrication process tolerances. It is shown that this sensitivity can be minimized by properly selecting the refractive index of the waveguide material, using a larger focal length and employing a longer optical wavelength.

© 1981 Optical Society of America

Guided-wave optical thin-film Luneburg lenses: fabrication technique and properties

S. K. Yao, D. B. Anderson, R. R. August, B. R. Youmans, and C. M. Oania
Appl. Opt. 18(24) 4067-4079 (1979)

Index-profile computation for the generalized Luneburg lens

Ettore Colombini
J. Opt. Soc. Am. 71(11) 1403-1405 (1981)

Proton-exchanged Fresnel lenses in Ti:LiNbO₃ waveguides

Toshiaki Suhara, Shuji Fujiwara, and Hiroshi Nishihara
Appl. Opt. 25(19) 3379-3383 (1986)

Cladded radially inhomogeneous sphere lenses

K. Kikuchi, T. Morikawa, J. Shimada, and K. Sakurai
Appl. Opt. 20(3) 388-394 (1981)

Design of thin–film photonic metamaterial Lüneburg lens using analytical approach

Hanhong Gao, Baile Zhang, Steven G. Johnson, and George Barbastathis
Opt. Express 20(2) 1617-1628 (2012)